SIMCO ECM-H series monitor controll electrostatic chucks (ESCs)

SIMCO ECM-H Series (High-End Industrial Grade) - Technical Overview

Series Positioning

Top-tier electrostatic chuck (ESC) monitoring & control for advanced semiconductor manufacturing, including:

Logic/DRAM/3D NAND at ≤7nm nodes

High-power processes (etch, CVD, ALD)

Compound semiconductor (SiC/GaN) production

Key Technological Advantages

1. Ultra-High Precision Control

Voltage stability: ±0.05% of setpoint (0-5kV DC/AC)

Current resolution: 10nA (leakage current detection)

Temperature uniformity: ±0.3°C across 300mm wafer

2. Multi-Channel Architecture

SIMCO ECM-H Series Model Overview

Positioning: High-precision electrostatic chuck monitoring and control system for advanced semiconductor manufacturing (such as logic/memory chips, compound semiconductors), supporting harsh process environments (plasma, high temperature, etc.).

1. Standard models (single/dual/quad channels)

Model Number of channels Temperature control Voltage range Key functions Typical application scenarios

ECM-H1 1 Single zone 0-5kV DC Basic high-precision monitoring, SECS/GEM communication Packaging equipment, small etcher

ECM-H2 2 Dual independent zones 0-5kV DC Dual-channel synchronous control, support AC/DC mode Thin film deposition (PVD/CVD)

ECM-H4 4 Four independent zones 0-5kV DC Multi-zone temperature uniformity control, EtherCAT real-time communication 300mm wafer etching/lithography machine

2. High-voltage/high-frequency extended models

Model Special functions Voltage/frequency range Applicable scenarios

ECM-H2-HV Support 10kV high voltage (SiC/GaN process) 0-10kV DC Wide bandgap semiconductor manufacturing

ECM-H4-RF Integrated RF impedance matching (13.56MHz plasma) 0-5kV DC + RF synchronization advanced etching/stripping equipment

3. Customized models (OEM/special needs)