Swagelok ALD7 UHPVSNA600 Ultrahigh-Purity Diaphragm Valve for Atomic Layer Deposition

Swagelok ALD7UHPVSNA600 is a state-of-the-art ultrahigh-purity (UHP) diaphragm valve from the ALD7 Series, specifically engineered for critical atomic layer deposition (ALD) processes in semiconductor manufacturing. This advanced valve represents the latest innovation in ALD valve technology, enabling semiconductor fabricators to improve chip yields through maximum dosing precision, fast actuation, and consistent performance over tens of millions of production cycles.

As the successor to Swagelok's industry-leading ALD6 valve, the ALD7 provides enhanced flow consistency, flow capacity, and actuator speed necessary to overcome limitations in current production processes and keep up with global semiconductor demand.

Key Features & Benefits

Ultra-Fast Actuation: Delivers precise dosing with actuator response times as low as 5 milliseconds for open and close cycles, ensuring exceptional dosing precision in demanding ALD applications.

Ultrahigh Cycle Life: Engineered to provide consistent, repeatable performance valve-to-valve, dose-to-dose, and chamber-to-chamber over the course of tens of millions of production cycles.

Superior Thermal Stability: Features an integrated thermal isolator allowing the valve body to be heated up to 392°F (200°C) while keeping the pneumatic actuator below its maximum operating temperature of 302°F (150°C), supporting low-vapor-pressure precursors requiring high-temperature delivery.

Exceptional Corrosion Resistance: Valve body constructed from proprietary ultrahigh-purity Swagelok 316L VIM-VAR stainless steel for enhanced resistance to corrosive precursor gases used in ALD processes.

Compact Footprint: Maintains the same 1.5-inch (38.1mm) footprint as existing industry-standard ALD valves, allowing integration into new tools or legacy equipment without requiring retooling.

High Flow Capacity: Delivers a flow coefficient (Cv) of 0.7 with optional custom factory-set versions available from 0.5–0.7 Cv.

Technical Specifications (ALD7UHPVSNA600)

Specification Detail

Manufacturer Swagelok 

Series ALD7 Series Ultrahigh-Purity Diaphragm Valves 

Product Type UHP Diaphragm Valve for Atomic Layer Deposition 

Working Pressure Vacuum to 145 psig (10.0 bar) 

Burst Pressure >3200 psig (220 bar) 

Actuation Pressure 60 to 120 psig (4.1 to 8.27 bar) 

Temperature Rating (Body) 32°F to 392°F (0°C to 200°C) 

Temperature Rating (Actuator) 32°F to 302°F (0°C to 150°C) 

Flow Coefficient (Cv) 0.7 (standard) 

Body Material 316L VIM-VAR Stainless Steel 

Diaphragm Material Cobalt-based Superalloy 

End Connections VCR® fittings, tube butt weld, 1.5 in. modular surface-mount high-flow C-seal 

Actuator Type Pneumatic, normally closed 

Applications and Industry Use

The Swagelok ALD7UHPVSNA600 is specifically designed for critical semiconductor manufacturing applications:

Atomic Layer Deposition (ALD) Processes: Delivering precise, repeatable doses of precursor gases for thin film deposition.

Low-Vapor-Pressure Precursor Handling: Supporting high-temperature delivery requirements for advanced chemistries.

Semiconductor Tool Manufacturing: Integration into new generation chip production equipment.

High-Temperature Gas Box Applications: Full actuator and valve body integration with thermal stability.

Advanced Engineering for Semiconductor Manufacturing

The ALD7 valve represents Swagelok's responsive technical leadership in the semiconductor manufacturing industry. Since introducing the world's first fit-for-purpose ALD valve nearly 20 years ago, Swagelok has worked closely with semiconductor customers to understand their performance needs as chip manufacturers continue shrinking process nodes and maximizing chip yields.

Key Technological Advantages:

Enhanced Actuator Technology: Provides the flow consistency and speed necessary to maximize chip throughput in new or existing semiconductor manufacturing tools .

Integrated Thermal Isolator: Maximizes limited space near the reaction chamber while maintaining temperature uniformity.

Valve-to-Valve Consistency: Ensures uniform performance across multiple valves, doses, and chambers over ultrahigh cycle life.

Why Choose Genuine Swagelok ALD7 Valves?

Selecting genuine Swagelok ALD7 valves is critical for semiconductor manufacturing success. These valves are engineered to provide the extreme levels of precision, consistency, cleanliness, and high cycle life necessary to keep up with the quick pace of innovation in the semiconductor marketplace.

Unlike standard industrial valves, Swagelok ALD series valves are purpose-built for the unique demands of atomic layer deposition, offering:

Uncompromising purity for critical applications

Validated performance under variable process conditions

Enhanced productivity without increasing operating costs 

Ordering and Availability

The Swagelok ALD7UHPVSNA600 is available in modular surface-mount configurations with high-flow C-seal, straight configurations with tube butt weld, and Swagelok VCR® face seal fitting end connections . High-temperature electronic position sensors, optical position sensors, or solenoid pilot valve configurations are also available as add-on components.

For purchasing, availability, and pricing information, please contact your local authorized Swagelok sales and service center. For detailed technical information, refer to the official Swagelok ALD7 Series catalog.

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