RIKEN molecular pumps UL industrial series

Below is an in-depth analysis and model overview of the RIKEN UL Industrial Series molecular pumps. Designed for demanding 24/7 industrial environments, this series focuses on large-scale production scenarios such as semiconductor manufacturing, photovoltaic cells, and flat-panel displays. With ultimate reliability, exceptional contamination resistance, and zero maintenance costs, it sets the standard for industrial vacuum.

I. Series Core Positioning

Features

Technical Solutions

Industrial Value

Production-grade durability: 80,000 hours MTBF (mean time between failures), supporting 24/7 continuous operation and ≤ 1 hour of annual fab downtime.

Particle Contamination Resistance: Patented self-cleaning flow channel and ceramic-coated rotors tolerate particles ≤ 100 μm, suitable for PVD/CVD coating dust environments.

Chemical Corrosion Protection: All series feature standard Hastelloy C-276 flow channels (optional Ta lining), resistant to HF/Cl₂/O₃ etching gases.

Modular Power Supply: N+1 redundant, hot-swappable power supply with a switchover time of ≤ 10 ms, preventing wafer loss due to vacuum chamber failure.

Intelligent Predictive Maintenance: Built-in AI vibration analysis module provides 72-hour early warning of failures, allowing maintenance plans to seamlessly integrate with production cycles.

II. Model Compatibility with Industrial Applications

Model: Pumping Speed (N₂) Ultimate Vacuum: Inlet Flange: Power: Production Line-Specific

UL-400 400 L/s 5×10⁻⁷ Pa* DN100 ISO 1.8 kW Photovoltaic cell PECVD, OLED evaporation equipment

UL-800 800 L/s 3×10⁻⁷ Pa* DN160 ISO 3.2 kW Semiconductor etcher (RIE), display panel sputtering

UL-2000 2000 L/s 1×10⁻⁷ Pa* DN250 ISO 7.5 kW Logic chip EUV lithography chamber, memory chip ALD

UL-5000H 5000 L/s 5×10⁻⁷ Pa* DN400 ISO 14 kW Silicon carbide epitaxial furnace, wafer-level packaging vacuum lamination

Note: Extreme vacuum achieved with a dry pump (e.g., Ebara DAP Series)

Industrial Hardening Suffixes:

/P: Dust-Proof Version (Flow Channel Electrostatic Precipitator + Ceramic Coating)

/C: Ultra-Corrosion-Resistant Version (Tantalum Metal Liner)

/R: Redundant Power Supply Version (Dual Input + N+1 Modules)

III. Selection Decision Matrix

1. Selection by Process Type

Process Challenge Recommended Model

Chip EUV Lithography, Micro-Vibration Sensitivity: UL-2000 + Vibration Isolation Mount

Oxide CVD, Nano-Dust Accumulation: UL-800/P

Metal Etching (Cl₂/BCl₃), Highly Corrosive Gas: UL-400/C

SiC Epitaxy (SiH₄/H₂), High-Flow Hydrogen: UL-5000H

2. Matching by Production Capacity

Production Line Rhythm, Vacuum Requirements Recommended Solution

High Mix Production (>100,000 wafers/month), Zero Downtime Risk: UL Series + /R Redundant Power Supply + Dual Forepumps

Standard Mass Production, Cost Efficiency Prioritized: UL Basic Version + Intelligent Predictive Maintenance

3. Industrial Foreline Pump Portfolio

UL Models: Best Dry Pump Partners, Ultimate Vacuum

UL-400 Ebara DAP-60 6 × 10⁻⁷ Pa

UL-2000 Leyvac DHD 800 2 × 10⁻⁷ Pa

UL-5000H Edwards nXRH 10000 5 × 10⁻⁷ Pa